The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 1992

Filed:

Jul. 17, 1991
Applicant:
Inventors:

Hiroshi Uchiyama, Hiratsuka, JP;

Satiko Okazaki, Tokyo, JP;

Masuhiro Kogoma, Saitama-ken, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B / ;
U.S. Cl.
CPC ...
427 38 ; 427444 ;
Abstract

According to this invention, there is provided an atmospheric pressure plasma surface treatment process comprising the steps of introducing a gas in a plasma reaction apparatus having a pair of dielectric-covered electrodes having opposing surfaces on at least one of which is provided with a solid dielectric; performing plasma excitation under atmospheric pressure; and surface treating an object placed between the opposing electrodes, wherein the gas introduced is a gaseous composition consisting essentially of argon, helium and/or ketone. This process makes it possible to quickly imparting hydrophilic nature to surfaces of an object made of a plastic to be treated. The hydrophilic nature given lasts long.


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