Yogita Pareek

Title: Innovator Yogita Pareek: Pioneering Protective Coating Technologies

Introduction

Yogita Pareek is an accomplished inventor based in San Jose, California. With a remarkable portfolio of seven patents, she has significantly contributed to advancements in protective coating technologies used in various processing chambers.

Latest Patents

Yogita's latest patents showcase innovative methods aimed at forming protective coatings on processing chamber surfaces or components. One notable invention involves the fabrication of a protective coating containing cerium oxide, specifically designed for surfaces exposed to plasma in processing chambers. The method utilizes an atomic layer deposition (ALD) process, which involves sequential exposure of the chamber's surface to a cerium precursor, purge gas, and oxidizing agent, ensuring a consistent deposition of the cerium oxide layer. Additionally, another significant achievement includes the development of a method for forming a protective coating film that resists halide plasma. This patented process also employs an ALD technique, starting with the deposition of a seed layer followed by a rare-earth containing oxide layer, which is then exposed to fluorine-containing plasma.

Career Highlights

Yogita Pareek is currently working at Applied Materials, Inc., a company renowned for its innovative approaches to materials engineering. Throughout her career, she has focused on developing advanced materials and processes that enhance the functionality and durability of key components in various technologies.

Collaborations

Yogita has collaborated with notable coworkers, including Prerna Sonthalia Goradia and Ankur Kadam. These collaborations have fostered a creative environment where innovative ideas can thrive, resulting in patents that push the boundaries of current technology.

Conclusion

With her expertise and dedication, Yogita Pareek continues to make significant strides in the field of protective coating technologies. Her innovative approaches not only enhance the performance of processing chambers but also contribute to the broader landscape of materials science and engineering. As she forges ahead, her work will undoubtedly inspire future generations of inventors and innovators.