The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2021
Filed:
May. 10, 2019
Applicants:
Applied Materials, Inc., Santa Clara, CA (US);
University of California, San Diego, La Jolla, CA (US);
Inventors:
Yogita Pareek, San Jose, CA (US);
Kevin A. Papke, Portland, OR (US);
Emily Sierra Thomson, La Jolla, CA (US);
Mahmut Sami Kavrik, Santa Barbara, CA (US);
Andrew C. Kummel, San Diego, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/02 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); C23C 16/56 (2006.01); C23C 16/20 (2006.01); C23C 16/34 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45536 (2013.01); C23C 16/0272 (2013.01); C23C 16/0281 (2013.01); C23C 16/20 (2013.01); C23C 16/34 (2013.01); C23C 16/403 (2013.01); C23C 16/45529 (2013.01); C23C 16/50 (2013.01); C23C 16/56 (2013.01); C23C 16/45555 (2013.01);
Abstract
A method of forming a protective coating film for halide plasma resistance includes depositing a seed layer on a surface of an article via an atomic layer deposition (ALD) process, depositing a rare-earth containing oxide layer on the seed layer via an ALD process, and exposing the rare-earth containing oxide layer to fluorine-containing plasma.