The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2021
Filed:
Oct. 13, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Mats Larsson, Sunnyvale, CA (US);
Yogita Pareek, San Jose, CA (US);
Jianqi Wang, Fremont, CA (US);
Kevin A. Papke, Portland, OR (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01); C09D 5/08 (2006.01); H01L 21/683 (2006.01); B05D 1/18 (2006.01); C09D 1/00 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C09D 5/08 (2013.01); B05D 1/18 (2013.01); C09D 1/00 (2013.01); H01J 37/32495 (2013.01); H01L 21/67069 (2013.01); H01L 21/6831 (2013.01); H01J 2237/334 (2013.01);
Abstract
Embodiments of the disclosure provide a chamber component for use in a plasma processing chamber apparatus. The chamber component may include a coating layer that provides a fluorine-rich surface. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes a body having an outer layer comprising yttria having a coating layer formed thereon, wherein the coating layer comprises a yttrium fluoride containing material.