Yiping Wang

Title: The Innovative Journey of Yiping Wang

Introduction

Yiping Wang is a prominent inventor based in Boise, ID, whose impressive portfolio includes 16 patents. His contributions to the field of memory device technology are noteworthy, showcasing his innovative spirit and commitment to advancing electronic systems.

Latest Patents

Among his latest patents, Yiping Wang is recognized for his work on "Plasma-doped trenches for memory." This patent describes a method for forming a memory device that incorporates plasma-doped trenches. The process involves creating a stack of alternating layers of polysilicon and oxide materials, followed by etching a trench in the stack and doping it using a plasma doping process. Various gases such as Boron fluoride, diborane, methane, or Boron and Carbon Hydride diluted with Hydrogen or Helium are utilized in this procedure, allowing for the doping of the polysilicon material. Additionally, his patent addresses memory arrays consisting of strings of memory cells, comprising laterally-spaced memory blocks with vertical stacks of insulative and conductive tiers, highlighting his significant advancements in memory technology.

Career Highlights

Yiping Wang has established a noteworthy career at Micron Technology Incorporated, a leader in memory and storage solutions. His extensive work has contributed not only to the patent landscape but also to the technological advancements within the company.

Collaborations

Throughout his career, Yiping has collaborated with esteemed colleagues, including Yongjun Jeff Hu and Jordan D Greenlee. These collaborations have fostered an innovative environment, resulting in significant advancements in memory technology.

Conclusion

Yiping Wangs contributions to the field of memory devices exemplify the spirit of innovation. With a robust patent portfolio and a commitment to advancing technology at Micron Technology Incorporated, his work continues to shape the future of memory solutions.