Yihua Shen

Title: Yihua Shen: Innovator in Semiconductor Technology

Introduction

Yihua Shen is a prominent inventor based in Shanghai, China, known for his significant contributions to semiconductor technology. With a total of 8 patents to his name, he has made remarkable advancements in the fabrication methods of semiconductor devices.

Latest Patents

One of his latest patents is titled "Semiconductor device and fabrication method thereof." This patent describes a method for fabricating a semiconductor device that involves forming a first mask layer, a second mask layer, and a plurality of first patterned layers on an interlayer dielectric layer and a plurality of gate structures. The method includes creating a plurality of first openings that separate the first patterned layers across a source region, a drain region, and a portion of an isolation area between these regions. The second mask layer is then patterned by etching, followed by the formation of discrete second patterned layers above the isolation areas. The process concludes with the formation of a metal silicide layer on each source/drain region.

Another notable patent is "Semiconductor device with local interconnect structure and manufacturing method thereof." This patent outlines a method for manufacturing a semiconductor device that features a local interconnect structure. The process begins with providing a semiconductor substrate that has a gate on an active region, followed by etching a first dielectric layer to create a first interconnect trench. The method further includes forming a metal silicide layer at the bottom of this trench and filling it with a first metal layer. Subsequent steps involve creating additional interconnect trenches and forming a second metal layer to establish the local interconnect structure.

Career Highlights

Yihua Shen has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to refine his expertise in semiconductor device fabrication.

Collaborations

Throughout his career, Yihua has collaborated with esteemed colleagues such as Yunchu Yu and Fenghua Fu. Their joint efforts have contributed to the advancement of semiconductor technologies.

Conclusion

Yihua Shen's innovative work in semiconductor technology has led to significant advancements in the field. His patents reflect a deep understanding of fabrication methods that are crucial for the development of modern semiconductor devices.