Yaoyu Zhan

Title: Innovations of Yaoyu Zhan in High-Voltage Device Reliability

Introduction

Yaoyu Zhan is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of high-voltage devices, particularly through his innovative patent that enhances the reliability of metal gate devices. His work is crucial in advancing technology in integrated circuits.

Latest Patents

Yaoyu Zhan holds a patent titled "Process method for improving reliability of metal gate high-voltage device." This patent outlines a process that involves stacking layers over a gate oxide layer, which are spaced apart from each other. An SiCN layer is deposited to cover the tops and sidewalls of the stack layers, as well as the bottoms of the slots between them. A HARP layer is then deposited to cover the SiCN layer. The process includes photolithography and etching to open the HARP layer over the stack layers while reserving the photoresist in the slot regions. This innovative method is designed to improve the overall reliability of high-voltage devices.

Career Highlights

Yaoyu Zhan is currently employed at Shanghai Huali Integrated Circuit Corporation, where he continues to develop and refine technologies related to integrated circuits. His expertise in high-voltage devices has positioned him as a valuable asset to his company and the industry at large.

Collaborations

Throughout his career, Yaoyu Zhan has collaborated with notable colleagues, including Qiwei Wang and Zhigang Zhang. These collaborations have fostered an environment of innovation and have contributed to the advancement of their shared goals in the field of integrated circuits.

Conclusion

Yaoyu Zhan's contributions to the field of high-voltage devices through his innovative patent demonstrate his commitment to enhancing technology in integrated circuits. His work not only reflects his expertise but also his dedication to improving device reliability.