Los Altos, CA, United States of America

Yang Pan

This inventor holds 45 USPTO granted patents and 20 published patent applications and 2 EPO patents, primarily in Plasma Etching. Top assignees: Lam Research Corporation, Coventor, Inc., Lam Research Corpporation. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yang Pan. Retrieved from https://idiyas.com/inventor/yang-pan-uyuxjhz2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 45 

% Patents Active = 97.8

 

Average Co-Inventor Count = 5.7

ph-index = 8

Forward Citations = 172(Granted Patents)


Location History:

  • Fremont, CA (US) (2021)
  • Los Altos, CA (US) (2018 - 2024)

Company Filing History:


Years Active: 2018-2026

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Areas of Expertise:
Plasma Etching
Atomic Layer Etching
Tin Oxide Films
Photoresist Development
High Aspect Ratio
Nanowires
Memory Devices
Selective Deposition
Etching Chemistries
Subtractive Metal Etch
Environmental Protection
Patterning Techniques
45 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Yang Pan from Los Altos, CA

Introduction

Yang Pan, based in Los Altos, California, is a prominent inventor in the semiconductor industry and holds an impressive portfolio of 27 patents. His groundbreaking work focuses on advanced materials and processes that enhance the production and efficiency of semiconductor devices.

Latest Patents

Among his latest innovations are two significant patents. The first is titled "Integrated Dry Processes for Patterning Radiation Photoresist Patterning." This patent describes methods for creating thin-films on semiconductor substrates using extreme ultraviolet (EUV) technology. The process involves depositing an organometallic polymer-like material onto the substrate's surface, applying EUV for pattern formation, and subsequently developing the pattern for transfer to underlying layers. Techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) are utilized to achieve this.

His second notable patent, "Tin Oxide Mandrels in Patterning," outlines the use of tin oxide films as mandrels in the manufacturing of semiconductor devices. This innovative process begins by patterning a tin oxide layer with etch chemistries, forming protruding features. A conformal layer of spacer material is then applied to the mandrels, which is selectively removed from horizontal surfaces, leaving the spacer material on the sidewalls. This process enables the creation of highly precise patterns on the underlying substrate layers.

Career Highlights

Yang Pan is a key member at Lam Research Corporation, where he leverages his expertise to advance semiconductor technologies. His contributions have significantly impacted the field, pushing the boundaries of what's possible in semiconductor manufacturing.

Collaborations

Throughout his career, Yang has collaborated with notable colleagues, including Samantha SiamHwa Tan and Jengyi Yu. These partnerships have fostered an environment of innovation and creativity, further driving advancements in semiconductor technologies.

Conclusion

Yang Pan's dedication to innovation in the semiconductor industry is evidenced by his array of patents and impactful work at Lam Research Corporation. His contributions not only enhance manufacturing processes but also mark him as a leading figure in the field. As technology continues to evolve, inventors like Yang will remain at the forefront, shaping the future of semiconductors and electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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