The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2025
Filed:
Jun. 08, 2021
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Ran Lin, Fremont, CA (US);
Wenbing Yang, Campbell, CA (US);
Tamal Mukherjee, Fremont, CA (US);
Jengyi Yu, San Ramon, CA (US);
Samantha Siamhwa Tan, Newark, CA (US);
Yang Pan, Los Altos, CA (US);
Yiwen Fan, Fremont, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23F 4/00 (2006.01); H01L 21/02 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32862 (2013.01); C23F 4/00 (2013.01); H01J 2237/334 (2013.01); H01L 21/02071 (2013.01); H01L 21/32136 (2013.01);
Abstract
A method for cleaning a plasma processing chamber comprising one or more cycles is provided. Each cycle comprises performing an oxygen containing plasma cleaning phase, performing a volatile chemistry type residue cleaning phase, and performing a fluorine containing plasma cleaning phase.