Samantha Siamhwa Tan

Title: Innovations by Samantha Siamhwa Tan

Introduction

Samantha Siamhwa Tan is a prominent inventor based in Newark, CA, known for her significant contributions to the field of semiconductor processing. With a total of eight patents to her name, she has developed innovative methods that enhance the efficiency and effectiveness of plasma processing chambers.

Latest Patents

Among her latest patents is a method for cleaning a plasma processing chamber. This method involves multiple cycles, including an oxygen-containing plasma cleaning phase, a volatile chemistry type residue cleaning phase, and a fluorine-containing plasma cleaning phase. Another notable patent is her method of cleaning chamber components with metal etch residues. This method specifically addresses the removal of ruthenium (Ru) residue from semiconductor processing chamber components using a cleaning composition that includes hypochlorite and other oxygen-based chemistries.

Career Highlights

Samantha has worked with Lam Research Corporation, a leading company in the semiconductor industry. Her work there has been instrumental in advancing cleaning technologies for semiconductor manufacturing processes.

Collaborations

Throughout her career, Samantha has collaborated with talented individuals such as Yang Pan and Yiwen Fan. These collaborations have contributed to her innovative approaches and successful patent applications.

Conclusion

Samantha Siamhwa Tan's contributions to the field of semiconductor processing through her patents and collaborations highlight her role as a leading inventor. Her innovative methods continue to impact the industry positively.