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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12400842 B1

PDFFull Text
Date of Patent:
Aug. 26, 2025

Filed:

Dec. 06, 2021

Method of cleaning chamber components with metal etch residues

Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Wenbing Yang, Campbell, CA (US);

Samantha Siamhwa Tan, Newark, CA (US);

Ran Lin, Fremont, CA (US);

Tamal Mukherjee, Fremont, CA (US);

Chunhong Zhou, Fremont, CA (US);

Xiaoyu Kang, Union City, CA (US);

Yang Pan, Los Altos, CA (US);

Hong Shih, Cupertino, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:

Beyer Law Group LLP

Primary Examiner:

Michael E Barr

Assistant Examiner:

Richard Z Zhang

Int. Cl.
CPC ...
H01J 37/32 (2006.01); B08B 3/04 (2006.01); B08B 3/08 (2006.01); B08B 9/08 (2006.01); C11D 7/08 (2006.01); C11D 7/10 (2006.01); C11D 7/32 (2006.01); C11D 7/50 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32862 (2013.01); B08B 3/08 (2013.01); B08B 9/08 (2013.01); C11D 7/08 (2013.01); C11D 7/10 (2013.01); C11D 7/3218 (2013.01); C11D 7/5013 (2013.01); C23C 16/4407 (2013.01); B08B 3/04 (2013.01); H01J 2237/022 (2013.01);
Abstract

A method of cleaning residue containing ruthenium (Ru) residue on at least one surface of a component of a semiconductor processing chamber is provided. The residue is exposed to a Ru cleaning composition comprising at least one of hypochlorite and Obased chemistries, wherein the Ru cleaning composition removes the Ru residue.

Find Patent Forward Citations

Yang, Wenbing. (2025). Method of cleaning chamber components with metal etch residues (U.S. Patent No. 12400842). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12400842

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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