Chunhong Zhou

Title: The Innovations of Chunhong Zhou

Introduction

Chunhong Zhou is a notable inventor based in Fremont, CA, who has made significant contributions to the field of semiconductor processing. With a total of 2 patents, Zhou has developed innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Zhou's latest patents include a method of cleaning chamber components with metal etch residues. This method addresses the challenge of removing ruthenium (Ru) residue from semiconductor processing chamber components. The cleaning composition utilized in this method comprises hypochlorite and other Ru-based chemistries, effectively eliminating the unwanted residue. Another significant patent focuses on silicon electrode assembly surface decontamination by acidic solution. This method efficiently cleans silicon surfaces of electrode assemblies, removing contaminants without discoloring the silicon. The acidic solution used in this process includes hydrofluoric acid, nitric acid, acetic acid, and deionized water.

Career Highlights

Chunhong Zhou is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work has been instrumental in advancing cleaning technologies that are crucial for maintaining the integrity of semiconductor components.

Collaborations

Zhou has collaborated with talented coworkers, including Hong Shih and Tuochuan Huang, who have contributed to his innovative projects and research endeavors.

Conclusion

Chunhong Zhou's contributions to semiconductor processing through his patents and work at Lam Research Corporation highlight his role as a key innovator in the industry. His methods for cleaning semiconductor components are vital for enhancing manufacturing processes and ensuring high-quality production.