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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12256645 B1

PDFFull Text
Date of Patent:
Mar. 18, 2025

Filed:

Jul. 20, 2020

Chemical etch nonvolatile materials for mram patterning

Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Wenbing Yang, Campbell, CA (US);

Tamal Mukherjee, Fremont, CA (US);

Zhongwei Zhu, Sunnyvale, CA (US);

Samantha SiamHwa Tan, Newark, CA (US);

Ran Lin, Fremont, CA (US);

Yang Pan, Los Altos, CA (US);

Ziad El Otell, Leuven, BE;

Yiwen Fan, Fremont, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:

Beyer Law Group LLP

Primary Examiner:

Hsien Ming Lee

Int. Cl.
CPC ...
H10N 50/01 (2023.01); H01J 37/32 (2006.01); H10N 50/10 (2023.01); H10N 50/80 (2023.01); H10N 50/85 (2023.01);
U.S. Cl.
CPC ...
H10N 50/01 (2023.02); H01J 37/32449 (2013.01); H10N 50/10 (2023.02); H10N 50/80 (2023.02); H10N 50/85 (2023.02); H01J 2237/334 (2013.01);
Abstract

A method is provided. A substrate situated in a chamber is exposed to a halogen-containing gas comprising an element selected from the group consisting of silicon, germanium, carbon, titanium, and tin, and igniting a plasma to modify a surface of the substrate and form a modified surface. The substrate is exposed to an activated activation gas to etch at least part of the modified surface.

Find Patent Forward Citations

Yang, Wenbing. (2025). Chemical etch nonvolatile materials for mram patterning (U.S. Patent No. 12256645). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12256645

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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