Xinchun Lu

Title: **Xinchun Lu: Innovator in Chemical Mechanical Polishing Technologies**

Introduction

Xinchun Lu is an esteemed inventor based in Beijing, China, with a remarkable portfolio of seven patents to his name. His innovative contributions primarily revolve around advancements in chemical mechanical polishing methods and devices, demonstrating a significant impact on the semiconductor manufacturing industry.

Latest Patents

Among his latest patents are a monitoring method for chemical mechanical polishing and a chemical mechanical polishing device. The monitoring method involves loading a to-be-polished wafer with a carrier, attaching it to a polishing pad on a polishing platen, and supplying slurry between the polishing pad and the wafer. This method ensures precision in the polishing process by conditioning the polishing pad and obtaining strain data from the associated conditioning device. The collected strain data aids in determining conditioning deviations and assessing the wear state of the polishing pad.

Another noteworthy patent details a method for determining the thickness of a metal film on a wafer, alongside a polishing device and medium. This procedure incorporates measuring signals indicative of various thicknesses across the metal film and adjusting sampling coordinates based on measured topographies. Such innovations enhance the reliability and efficiency of polishing processes in semiconductor applications.

Career Highlights

Xinchun Lu has made significant strides in his career by contributing to prominent organizations. He has worked at Hwatsing Technology Co., Ltd. and Tsinghua University, where he played a pivotal role in advancing polishing technologies in semiconductor manufacturing.

Collaborations

Lu has collaborated with notable professionals, including Yongyong He and Tongqing Wang. These collaborations have further enriched his research pursuits, enabling the development of innovative solutions that address critical challenges in the industry.

Conclusion

Xinchun Lu's inventive prowess in chemical mechanical polishing exemplifies his commitment to innovation in technology. His patents not only advance the field but also pave the way for enhanced manufacturing processes in the semiconductor industry. As his career progresses, it will be exciting to see how his contributions continue to shape future advancements.