Xiaolong Fang

Title: Innovations of Inventor Xiaolong Fang

Introduction

Xiaolong Fang is a prominent inventor based in Boise, ID (US), known for his significant contributions to the field of semiconductor technology. With a total of 8 patents to his name, Fang has made remarkable advancements that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Fang's latest patents include innovative methods for semiconductor growth substrates and associated systems for die singulation. One representative method involves forming spaced-apart structures at a dicing street located between neighboring device growth regions of a substrate material. This method allows for the epitaxial growth of semiconductor material, facilitating the formation of semiconductor devices that can be separated at the dicing street by removing the spaced-apart structures and the underlying substrate material. Another notable patent details a method of forming a plurality of spaced features, which includes the use of sacrificial hardmask material with at least two layers of different composition. This method enables the creation of individual features with specific tensile intrinsic stress properties, enhancing the overall performance of the underlying material.

Career Highlights

Xiaolong Fang is currently employed at Micron Technology Incorporated, where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in developing new technologies that improve the manufacturing processes of semiconductor devices.

Collaborations

Fang has collaborated with notable colleagues, including Farrell Martin Good and Baosuo Zhou, contributing to a dynamic and innovative work environment.

Conclusion

Xiaolong Fang's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a leading inventor in the field. His work not only advances the technology but also sets a foundation for future innovations in semiconductor manufacturing.