The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2015

Filed:

Jan. 12, 2012
Applicants:

Xiaolong Fang, Boise, ID (US);

Lifang Xu, Boise, ID (US);

Tingkai LI, Camas, WA (US);

Thomas Gehrke, Boise, ID (US);

Inventors:

Xiaolong Fang, Boise, ID (US);

Lifang Xu, Boise, ID (US);

Tingkai Li, Camas, WA (US);

Thomas Gehrke, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/50 (2010.01); H01L 33/48 (2010.01); H01L 21/66 (2006.01); H01L 23/544 (2006.01); H01L 33/00 (2010.01); H01L 21/78 (2006.01);
U.S. Cl.
CPC ...
H01L 33/48 (2013.01); H01L 22/10 (2013.01); H01L 23/544 (2013.01); H01L 33/007 (2013.01); H01L 33/0095 (2013.01); H01L 22/34 (2013.01); H01L 21/78 (2013.01);
Abstract

Semiconductor growth substrates and associated systems and methods for die singulation are disclosed. A representative method for manufacturing semiconductor devices includes forming spaced-apart structures at a dicing street located between neighboring device growth regions of a substrate material. The method can further include epitaxially growing a semiconductor material by adding a first portion of semiconductor material to the device growth regions and adding a second portion of semiconductor material to the structures. The method can still further include forming semiconductor devices at the device growth regions, and separating the semiconductor devices from each other at the dicing street by removing the spaced-apart structures and the underlying substrate material at the dicing street.


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