The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2013
Filed:
Mar. 30, 2010
Farrell Good, Meridian, ID (US);
Baosuo Zhou, Boise, ID (US);
Xiaolong Fang, Boise, ID (US);
Fatma Arzum Simsek-ege, Boise, ID (US);
Farrell Good, Meridian, ID (US);
Baosuo Zhou, Boise, ID (US);
Xiaolong Fang, Boise, ID (US);
Fatma Arzum Simsek-Ege, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A method of forming a plurality of spaced features includes forming sacrificial hardmask material over underlying material. The sacrificial hardmask material has at least two layers of different composition. Portions of the sacrificial hardmask material are removed to form a mask over the underlying material. Individual features of the mask have at least two layers of different composition, with one of the layers of each of the individual features having a tensile intrinsic stress of at least 400.0 MPa. The individual features have a total tensile intrinsic stress greater than 0.0 MPa. The mask is used while etching into the underlying material to form a plurality of spaced features comprising the underlying material. Other implementations are disclosed.