Xiang Zhou

Title: Innovations of Inventor Xiang Zhou

Introduction

Xiang Zhou is a prominent inventor based in Santa Clara, California. He holds a total of nine patents, showcasing his significant contributions to the field of technology and engineering. His work primarily focuses on advancements in lithography and radio frequency systems.

Latest Patents

One of Xiang Zhou's latest patents is titled "Reducing roughness of extreme ultraviolet lithography resists." This patent provides methods and systems for reducing the roughness of EUV resists and improving etched features. The methods involve depositing a thin film on a patterned EUV resist, which has a stress level that is less compressive than that of the patterned resist. This innovative approach helps to reduce buckling and bulging of the patterned EUV resist. Another notable patent is related to "Synchronization of RF generators." This patent describes systems and methods for synchronizing radio frequency generators. It includes a method where a first RF generator receives a recipe set for operating, while a second RF generator receives a different recipe set. The method ensures that both generators operate in synchronization, enhancing efficiency in their applications.

Career Highlights

Xiang Zhou has made significant strides in his career, particularly through his work at Lam Research Corporation. His expertise in lithography and RF systems has positioned him as a key player in the industry, contributing to various technological advancements.

Collaborations

Xiang Zhou has collaborated with notable colleagues, including Yoshie Kimura and Duming Zhang. These collaborations have further enriched his work and contributed to the success of his projects.

Conclusion

Xiang Zhou's innovative patents and career achievements highlight his important role in advancing technology in lithography and radio frequency systems. His contributions continue to influence the industry and inspire future innovations.