Giessen, Germany

Wolf Schorn

USPTO Granted Patents = 9 

 

Average Co-Inventor Count = 6.3

ph-index = 2

Forward Citations = 37(Granted Patents)


Location History:

  • Giessen, DE (2016 - 2020)
  • Waldbronn, DE (2023)

Company Filing History:


Years Active: 2016-2024

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9 patents (USPTO):Explore Patents

Title: **The Innovations of Wolf Schorn: A Patented Pioneer in Semiconductor Technology**

Introduction

Wolf Schorn, an accomplished inventor based in Giessen, Germany, stands out in the field of semiconductor technology with an impressive portfolio of 9 patents. His contributions have significantly advanced the art of gas-phase thin-film deposition and organometallic compounds, providing the foundation for cutting-edge applications in electronics and memory storage.

Latest Patents

Schorn's latest patents showcase his expertise in creating new metal complexes, particularly for gas-phase thin-film deposition. One of his notable inventions features metal complexes represented by the formula [M(L)(L)(hydra)], designed to facilitate advanced semiconductor processes. Another significant patent involves organometallic compounds poised for the manufacture of semiconductor elements or electronic memory, detailed by the general formula [Ru(arene)(R—N≡CR—CR≡N—R)] or [Ru(arene)((R,R)N—N≡CR—CR≡N—N(R,R))]. These compounds utilize a mix of mononuclear and polynuclear arenes, presenting a versatile range of applications.

Moreover, Schorn has elaborated on the production methods of these compounds, resulting in high-purity ruthenium(O) precursors. The innovations detailed in these patents provide effective, cost-efficient solutions with excellent yields, crucial for modern semiconductor manufacturing processes.

Career Highlights

Wolf Schorn currently holds a position at Umicore AG & Co. KG, where he plays a pivotal role in pioneering advancements in materials science. His dedication to research and development within this esteemed company reflects his commitment to innovation and excellence in his field.

Collaborations

Throughout his career, Schorn has collaborated with notable colleagues such as Ralf Karch and Annika Frey. These partnerships enhance the collaborative spirit in research and development, leading to breakthroughs that continue to push the boundaries of semiconductor technology.

Conclusion

In summary, Wolf Schorn's innovative contributions through his patents reveal his profound impact on the semiconductor industry. With a strong foundation in metal complexes and organometallic compounds, his work not only advances the technology but also sets a precedent for future inventors in the field. As the landscape of electronics evolves, Schorn's inventions remain vital to its progression and innovation.

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