The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2023
Filed:
Jul. 26, 2019
Umicore Ag & Co. KG, Hanau-Wolfgang, DE;
Nicholas Rau, Marburg, DE;
Jörg Sundermeyer, Marburg, DE;
Henrik Schumann, Weinbach, DE;
Andreas Rivas Nass, Bensheim, DE;
Annika Frey, Hanau, DE;
Wolf Schorn, Waldbronn, DE;
Eileen Woerner, Nidderau, DE;
Ralf Karch, Kleinostheim, DE;
Angelino Doppiu, Seligenstadt, DE;
UMICORE AG & CO. KG, Hanau-Wolfgang, DE;
Abstract
The invention relates to compounds in accordance with the general formula [Ru(arene)(R—N═CR—CR═N—R)] or [Ru(arene)((R,R)N—N═CR—CR═N—N(R,R))]. In this case, arene is selected from the group consisting of mononuclear and polynuclear arenes and heteroarenes. R, R, RH, Rand R-Rare independently selected from the group consisting of H, an alkyl radical (C1-C10) and an aryl radical. It further relates to methods for the production of these compounds, compounds obtainable according to these methods, their use and a substrate having on a surface thereof a ruthenium layer or a layer containing ruthenium. In addition, the invention relates to a method for producing compounds [Ru(arene)X]2, wherein arene is selected from the group consisting of mononuclear and polynuclear arenes and X=halogen, compounds of this type obtainable according to this method, and their use. The aforementioned ruthenium(O) compounds can be produced in a simple, cost-effective and reproducible manner with a high degree of purity and good yield. Due to their high degree of purity, they are suitable for use as ruthenium(O) precursors.