The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Aug. 18, 2014
Umicore Ag & Co. KG, Hanau-Wolfgang, DE;
Joerg Sundermeyer, Marburg, DE;
Annika Frey, Hanau, DE;
Wolf Schorn, Giessen, DE;
David Grosse-Hagenbrock, Marburg, DE;
Ralf Karch, Kleinostheim, DE;
Andreas Rivas-Nass, Schriesheim, DE;
Eileen Woerner, Nidderau, DE;
Angelino Doppiu, Seligenstadt, DE;
UMICORE AG & CO. KG, Hanau-Wolfgang, DE;
Abstract
The invention relates to a method for the cost-effective and environmentally friendly production of dialkyl indium chloride in high yield and with high selectivity and purity. The dialkyl indium chloride produced according to the invention is particularly suitable, also as a result of the high purity and yield, for the production, on demand, of indium-containing precursors in high yield and with high selectivity and purity. As a result of the high purity, the indium-containing precursors that can be produced are particularly suitable for metal organic chemical vapor deposition (MOCVD) or metal organic vapor phase epitaxy (MOVPE). The novel method according to the invention is characterized by the improved execution of the method, in particular a rapid process control. Owing to targeted and extensive use of raw materials that are cost-effective and have a low environmental impact, the method is also suitable for use on an industrial scale.