Wakefield, MA, United States of America

William Robert Entley

This inventor holds 7 USPTO granted patents and 1 published patent application. Top assignees: Lam Research Corporation, Mks Instruments, Inc.. Active years: 2011-2019.

USPTO Granted Patents = 7 

% Patents Active = 85.7

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 467(Granted Patents)


Company Filing History:


Years Active: 2011-2019

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7 patents (USPTO):Explore Patents

Title: The Innovations of William Robert Entley

Introduction

William Robert Entley is a notable inventor based in Wakefield, MA (US). He has made significant contributions to the field of plasma technology, holding a total of 7 patents. His work has advanced the understanding and application of plasma sources in various industrial processes.

Latest Patents

Entley's latest patents include innovative systems and methods for plasma generation. One of his patents describes a plasma source that features a ring plasma chamber, a primary winding, and multiple ferrites. This design allows for efficient extraction of choked flow elements, enhancing the performance of plasma processing systems. Another patent focuses on distributed multi-zone plasma source systems, which incorporate multiple plasma sources within a processing chamber. These advancements demonstrate Entley's commitment to improving plasma technology.

Career Highlights

Throughout his career, Entley has worked with prominent companies such as Lam Research Corporation and MKS Instruments, Inc. His experience in these organizations has allowed him to develop and refine his inventions, contributing to the advancement of plasma processing technologies.

Collaborations

Entley has collaborated with talented individuals in his field, including Ali Shajii and Andrew Cowe. These partnerships have fostered innovation and have played a crucial role in the development of his patented technologies.

Conclusion

William Robert Entley is a distinguished inventor whose work in plasma technology has led to significant advancements in the field. His innovative patents and collaborations reflect his dedication to pushing the boundaries of what is possible in plasma processing.

Profile summary based on public USPTO records.
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