The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Aug. 06, 2010
Ali Shajii, Weston, MA (US);
Richard Gottscho, Dublin, CA (US);
Souheil Benzerrouk, Hudson, NH (US);
Andrew Cowe, Andover, MA (US);
Siddharth P. Nagarkatti, Acton, MA (US);
William R. Entley, Wakefield, MA (US);
Ali Shajii, Weston, MA (US);
Richard Gottscho, Dublin, CA (US);
Souheil Benzerrouk, Hudson, NH (US);
Andrew Cowe, Andover, MA (US);
Siddharth P. Nagarkatti, Acton, MA (US);
William R. Entley, Wakefield, MA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described.