The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2018
Filed:
Sep. 26, 2012
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Ali Shajii, Weston, MA (US);
Richard Gottscho, Fremont, CA (US);
Souheil Benzerrouk, Hudson, NH (US);
Andrew Cowe, Andover, MA (US);
Siddharth P. Nagarkatti, Acton, MA (US);
William Entley, Wakefield, MA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/306 (2006.01); H05H 1/46 (2006.01); H01J 37/32 (2006.01); H05H 1/50 (2006.01);
U.S. Cl.
CPC ...
H05H 1/46 (2013.01); H01J 37/321 (2013.01); H01J 37/3266 (2013.01); H01J 37/32082 (2013.01); H01J 37/32422 (2013.01); H01J 37/32449 (2013.01); H01J 37/32669 (2013.01); H01J 37/32816 (2013.01); H05H 1/50 (2013.01); H01J 2237/334 (2013.01); H05H 2001/4682 (2013.01);
Abstract
A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.