The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

Oct. 10, 2012
Applicants:

Ali Shajii, Weston, MA (US);

Richard Gottscho, Fremont, CA (US);

Souheil Benzerrouk, Hudson, NH (US);

Andrew Cowe, Andover, MA (US);

Siddharth P. Nagarkatti, Acton, MA (US);

William R. Entley, Wakefield, MA (US);

Inventors:

Ali Shajii, Weston, MA (US);

Richard Gottscho, Fremont, CA (US);

Souheil Benzerrouk, Hudson, NH (US);

Andrew Cowe, Andover, MA (US);

Siddharth P. Nagarkatti, Acton, MA (US);

William R. Entley, Wakefield, MA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32431 (2013.01); H01J 37/321 (2013.01); H01J 37/32669 (2013.01);
Abstract

A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.


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