The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
Aug. 06, 2010
Applicants:
Ali Shajii, Weston, MA (US);
Richard Gottscho, Dublin, CA (US);
Souheil Benzerrouk, Hudson, NH (US);
Andrew Cowe, Andover, MA (US);
Siddharth P. Nagarkatti, Acton, MA (US);
William R. Entley, Wakefield, MA (US);
Inventors:
Ali Shajii, Weston, MA (US);
Richard Gottscho, Dublin, CA (US);
Souheil Benzerrouk, Hudson, NH (US);
Andrew Cowe, Andover, MA (US);
Siddharth P. Nagarkatti, Acton, MA (US);
William R. Entley, Wakefield, MA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); C23C 16/00 (2006.01); H05H 1/46 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H05H 1/46 (2013.01); H01J 37/3266 (2013.01); H01J 37/32422 (2013.01); H01J 37/32449 (2013.01); H01J 37/32669 (2013.01); H01J 37/32816 (2013.01); H01J 2237/334 (2013.01); H05H 2001/4682 (2013.01);
Abstract
A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.