Wenting Hou

Title: Biography of Wenting Hou

Introduction: Wenting Hou is an accomplished inventor based in San Jose, California. She has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. Her innovative work has advanced the methods and materials used in the production of layered substrates and interconnect structures.

Latest Patents: Among her latest patents is a method to produce a layered substrate, which involves depositing a diffusion barrier layer on the substrate, followed by an underlayer comprising a Group 6 metal, and finally a ruthenium layer. This process results in a highly efficient layered substrate. Another notable patent describes a method for forming an interconnect structure for semiconductor devices, which includes depositing an etch stop layer on a substrate and utilizing in situ deposition of a metal layer while maintaining a vacuum environment.

Career Highlights: Wenting Hou is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work at Applied Materials has positioned her as a key player in the development of advanced semiconductor manufacturing techniques.

Collaborations: Throughout her career, Wenting has collaborated with esteemed colleagues such as Jianxin Lei and Nobuyuki Sasaki. These collaborations have further enriched her research and innovation efforts in the semiconductor field.

Conclusion: Wenting Hou's contributions to semiconductor technology through her patents and collaborations highlight her role as a leading inventor in her field.