Weimin Ma

Title: Weimin Ma: Innovator in Data Processing and Overlay Alignment Technologies

Introduction

Weimin Ma is a prominent inventor based in Beijing, China. He has made significant contributions to the fields of data processing and overlay alignment technologies. With a total of 8 patents to his name, Ma's work has had a considerable impact on the industry.

Latest Patents

Among his latest patents is the "Overlay alignment mark and method for measuring overlay error." This invention provides an overlay alignment mark located in a patterned wafer, which includes a lower-layer pattern in a first layer and an upper-layer pattern in a second layer. The overlay alignment mark consists of a first pattern, which is a portion of the lower-layer pattern, and a second pattern, which is a portion of the upper-layer pattern. The method allows for precise measurement of overlay errors, enhancing the accuracy of semiconductor manufacturing processes. Another notable patent is the "Method and apparatus for data processing." This invention outlines methods and apparatuses for processing data packets, including the generation of a combined data packet and the application of specific processing codes.

Career Highlights

Weimin Ma has worked with notable companies such as Dongfang Jingyuan Electron Limited and Zhongke Jingyuan Electron Limited in Beijing. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Throughout his career, Ma has collaborated with talented individuals, including Zhaoli Zhang and Naihong Tang. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Weimin Ma's contributions to the fields of data processing and overlay alignment are noteworthy. His innovative patents and collaborations reflect his dedication to advancing technology. His work continues to influence the industry and inspire future innovations.