The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2019

Filed:

Oct. 05, 2016
Applicant:

Dongfang Jingyuan Electron Limited, Beijing, CN;

Inventors:

Weimin Ma, Beijing, CN;

Jian Zhang, San Jose, CA (US);

Zhaoli Zhang, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/62 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06K 9/6269 (2013.01); G06K 9/6228 (2013.01); G06T 7/0004 (2013.01); G06K 2209/19 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Methods, apparatuses and systems for classifying defects for a defect inspection system are disclosed. The defect inspection system can be used to inspect and manage wafer or reticle defects. The method includes receiving a defect record based on an inspection of a target specimen, the defect record comprising a defect image associated with an unknown defect, selecting, by a computing device using a first processing unit, components ranked by significance from the defect image using a first learning technique, and determining, by the computing device using the first processing unit, whether the defect image is associated with a known defect type based on the components ranked by significance using a second learning technique.


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