The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Oct. 05, 2016
Applicant:
Dongfang Jingyuan Electron Limited, Beijing, CN;
Inventors:
Weimin Ma, Beijing, CN;
Zongqiang Yu, Beijing, CN;
Assignee:
Dongfang Jingyuan Electron Limited, Beijing, CN;
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G03F 7/00 (2013.01); G06T 7/0085 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A method for reference image contour generation includes generating a mask pattern based on design target information, generating a reference image based on a simulation of photolithographic effects on the mask pattern, generating a reference image contour pattern based on edge detection in the reference image, and generating a scanned image contour pattern as a function of the reference image contour pattern and a scanned image of an integrated circuit.