Wei-Shiau Chen

Title: Innovations of Wei-Shiau Chen

Introduction

Wei-Shiau Chen is a prominent inventor based in Taiwan, China. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work primarily focuses on fabrication methods that enhance the performance and reliability of electronic devices.

Latest Patents

One of Wei-Shiau Chen's latest patents is a fabrication method for a multi-layered thin film protective layer. This method is applicable on a substrate that includes a peripheral circuit area and a pixel cell area. The process involves forming metal layers and pixel cells on the respective areas. A first oxide layer, a silicon nitride layer, and a second oxide layer are sequentially formed on these layers. The second oxide layer is patterned to define a predetermined position of a pad spacer in both areas. The silicon nitride layer and the first oxide layer are further defined to create a first protective layer in the peripheral circuit area and to form a pad spacer in the pixel cell area, exposing the pixel cells. A second protective layer is then formed on the exposed pixel cells.

Career Highlights

Wei-Shiau Chen has worked with notable companies in the semiconductor industry, including United Microelectronics Corporation and United Semiconductor Corporation. His experience in these organizations has allowed him to develop innovative solutions that address the challenges faced in semiconductor fabrication.

Collaborations

Throughout his career, Wei-Shiau Chen has collaborated with esteemed colleagues such as Kao-Su Huang and Shuenn-Jeng Chen. These partnerships have contributed to the advancement of technology in their respective fields.

Conclusion

Wei-Shiau Chen's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the industry. His work continues to influence the development of advanced electronic devices.