Wan-Chun Liao

Title: The Innovations of Wan-Chun Liao in Flash Memory Technology

Introduction

Wan-Chun Liao, an accomplished inventor based in Hsinchu County, Taiwan, has made significant strides in the field of semiconductor technology. With a total of five patents to his name, Liao's work focuses primarily on advancements in flash memory cells.

Latest Patents

Among his latest innovations is a patent for a sophisticated flash memory cell. This method of forming a flash memory cell involves several meticulous steps. It begins with the deposition of a first dielectric layer followed by a floating gate layer on a substrate. The invention features three blocking structures with oblique sidewalls extending from the bottom to the top, penetrating through both the first dielectric layer and the floating gate layer. The intricate etching process results in a first and a second floating gate with unique sharp top corners and oblique sidewalls. Further developments include forming isolating layers and selective gates that cover these floating gates, culminating in a sophisticated flash memory cell.

Another significant patent from Liao details a semiconductor structure and its manufacturing method. This patent outlines a semiconductor structure comprising a substrate, gate dielectric layer, floating gate, first dielectric layer, and control gate. The floating gate possesses at least one tip on its top surface, and the arrangement promotes an effective overlap with the control gate above, showcasing Liao's innovative approach to semiconductor design.

Career Highlights

Liao's professional journey is marked by his association with the United Microelectronics Corporation, a leading player in the semiconductor industry. His contributions have played a vital role in pushing the boundaries of semiconductor technology, particularly in enhancing the performance and reliability of flash memory devices.

Collaborations

Throughout his career, Liao has collaborated with talented colleagues, including Ping-Chia Shih and Kuei-Ya Chuang, who have worked alongside him to refine and develop his groundbreaking ideas. These collaborations not only foster innovation but also create an environment of shared knowledge and expertise within the semiconductor community.

Conclusion

Wan-Chun Liao continues to be a pivotal figure in the world of semiconductor technology. His recent patents, focusing on flash memory cell formation and semiconductor structures, demonstrate his commitment to innovation. As he progresses in his career, his work remains influential, showing potential for further advancements in the field.