Waltherus W Van Den Hoogenhof

Title: Waltherus W Van Den Hoogenhof: Innovator in X-ray Analysis

Introduction

Waltherus W Van Den Hoogenhof is a notable inventor based in Almelo, Netherlands. He has made significant contributions to the field of X-ray analysis, holding a total of nine patents. His work focuses on improving the accuracy and efficiency of quantitative X-ray measurements.

Latest Patents

Among his latest patents are two innovative methods for quantitative X-ray analysis. The first patent, titled "Quantitative X-ray analysis—ratio correction," describes a method that measures X-ray diffraction in transmission. This method involves taking a background measurement slightly away from the diffraction peak and using the ratio of measured intensities to correct for variations in sample composition. The second patent, "Quantitative X-ray analysis—matrix thickness correction," outlines a process for determining the elemental composition of a sample through X-ray fluorescence measurements. This method includes a correction measurement by measuring the transmitted intensity of X-rays at a specific energy, allowing for more accurate results in X-ray diffraction measurements.

Career Highlights

Waltherus has worked with prominent companies in the field, including Panalytical B.V. and U.S. Philips Corporation. His experience in these organizations has contributed to his expertise in X-ray technology and analysis.

Collaborations

Throughout his career, Waltherus has collaborated with notable colleagues such as Charalampos Zarkadas and Petronella Emerentiana Hegeman. These collaborations have further enriched his work and innovations in the field.

Conclusion

Waltherus W Van Den Hoogenhof is a distinguished inventor whose contributions to X-ray analysis have advanced the field significantly. His innovative patents and collaborations reflect his commitment to enhancing measurement techniques in scientific research.