The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2001
Filed:
Oct. 26, 1999
Waltherus W. Van Den Hoogenhof, Almelo, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
X-ray diffraction measurements are often carried out in a given atmosphere which may vary in respect of a variety of parameters, such as pressure, temperature, etc. Notably soft X-rays are very sensitive to atmospheric absorption. Therefore, the measured intensity is dependent not only on the material variables to be measured for the sample to be examined (,), but also on the varying absorption which thus constitutes a disturbing influencing of the X-rays in the X-ray optical path (,) from the X-ray source (,) to the detector (,). According to the invention a second X-ray optical path (,) is established; this second path deviates from the first X-ray optical path and serves to carry out reference measurements, during or between the actual measurements, in order to determine the absorption of the atmosphere and to determine a correction factor for the X-ray intensity measured during the actual measurements.