Panalytical B.v.

U.S. Philips Corporation

Koninklijke Philips Corporation N.V.

Waltherus W Van Den Hoogenhof

Charalampos Zarkadas

Petronella Emerentiana Hegeman

Jan Haisma

Lambertus Postma

Milen Gateshki

Alexander Kharchenko

Marcel Brouha

Peter W De Haas

Johannes Cornelis Jans

Peter C Van Loosdregt

Gustaaf Christian Brons

Jan Boldewijn

Bruno A R Vrebos

Marinus Willem Dirken

Hendrik A Van Sprang

Aleksandr Komelkov

Dirk K De Boer

Dick Kuiper

A method of X-ray analysis measures X-ray diffraction in transmission. In order to carry out quantitative measurements, a background measurement is taken slightly away from the diffraction peak and the ratio of measured intensities used to correct for variations in sample composition.

Quantitative X-ray analysis&#x2014;ratio correction

Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle &#x3c8;to the surface of the sample and measuring a measured intensity I(&#x3b8;) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle &#x3c8;corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.

Quantitative X-ray analysis&#x2014;matrix thickness correction

Apparatus includes an X-ray source, a wavelength dispersive X-ray detector for measuring X-ray fluorescence (XRF) and an energy dispersive X-ray detectoragain for measuring X-ray fluorescence. Selected elements are measured using the wavelength dispersive process to reduce the overall measurement time compared with using only one of the two detectors or compared to a simple approach of measuring low atomic number elements with the wavelength dispersive detector and high atomic number elements with the energy dispersive detector. The selection can take place dynamically, in particular on the basis of the results of the energy-dispersive detector.

Quantitative X-ray analysis&#x2014;multi optical path instrument

A limiting device () for electromagnetic radiation () includes an essentially flat beam cross-section limiter () which partly or completely encloses at least one passage aperture () for beams () and is constructed so that it also includes at least one second beam cross-section limiter () which, in the active position, constitutes at least one longitudinal component extending at an angle to the first beam cross-section limiter ().

Limiting device for electromagnetic radiation, notably in an analysis device

An X-ray optical diaphragm () which is provided with at least one passage opening () for rays is constructed in such a manner that the edge zone () of the X-ray optical diaphragm () which faces the passage opening () is angulated at least partly relative to the direction of propagation () of the rays.

X-ray optical system

The invention relates to a device for X-ray analysis with energy dispersive detection of fluorescent radiation. In order to enable the measurements to be carried out with a suitable position resolution, the analyzing radiation is conducted to the sample ( ) by means of an X-ray conducting capillary ( ) which is directed to the sample through the detector surface ( ). Practically all fluorescent radiation ( ) from the sample can be detected in such arrangement. According to the invention a detector is used in the form of an X-ray-sensitive CCD array ( ). Such a CCD array provides a better energy resolution in comparison with conventional EDX detectors. Moreover, for such CCD arrays a large amount of sophisticated software is available for reading out; moreover, such CCDs can be readily purchased, for example, as rejected visible light sensitive arrays in which a small number of pixels have dropped out.

X-ray analysis apparatus with an X-ray detector in the form of a CCD array

X-ray diffraction measurements are often carried out in a given atmosphere which may vary in respect of a variety of parameters, such as pressure, temperature, etc. Notably soft X-rays are very sensitive to atmospheric absorption. Therefore, the measured intensity is dependent not only on the material variables to be measured for the sample to be examined (,), but also on the varying absorption which thus constitutes a disturbing influencing of the X-rays in the X-ray optical path (,) from the X-ray source (,) to the detector (,). According to the invention a second X-ray optical path (,) is established; this second path deviates from the first X-ray optical path and serves to carry out reference measurements, during or between the actual measurements, in order to determine the absorption of the atmosphere and to determine a correction factor for the X-ray intensity measured during the actual measurements.

X-ray diffraction apparatus with an x-ray optical reference channel

Method of polishing a surface (5a) of copper or an alloy comprising mainly copper, in which a polishing means is moved across the surface while exerting a polishing pressure of approximately 500 g/cm.sup.2 for obtaining a plane and smooth polished surface without any defects. A composition of a polishing component comprising a colloidal suspension of SiO.sub.2 particles having an average particle size of between 20 and 50 nm in an alkali solution, demineralized water and a chemical activator is used as a polishing means.

Method of polishing a surface of copper or an alloy comprising mainly

In a cathode-ray tube for displaying colored pictures comprising in an evacuated envelope means to generate a number of electron beams, a display screen comprising a number of regions luminescing in different colors, and color selection means comprising a large number of apertures which assign each electron beam to luminescent regions of one color, in which color selection means a magnetic quadrupole field is generated to form a magnetic quadrupole electron lens in each aperture, which luminescent regions have the shape of substantially parallel strips the longitudinal direction of which is substantially parallel to the defocusing direction of the quadrupole lens, characterized in that the apertures are elongate, substantially hexagonal and symmetrical relative to their longitudinal axes and are situated with their longitudinal axes in a number of parallel rows which extend substantially parallel to the strips and the apertures of two juxtaposed rows are shifted relative to each other, it is possible, in spite of the large transmission of the color selection means, to obtain a display screen having very uniform phosphor strips.

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Almelo, Netherlands

Waltherus W Van Den Hoogenhof