Walter Haeckl

This inventor holds 10 USPTO granted patents and 5 published patent applications, plus 6 CIPO patents and 1 EPO patent. Top assignees: Wacker Chemie Ag, Siltronic Ag. Active years: 2008-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Walter Haeckl. Retrieved from https://idiyas.com/inventor/walter-haeckl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 (Patent Applications = 5)

% Patents Active = 90.0

CIPO Patents = 6

EPO Patents = 1 (Patent Applications = 1)

Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 11(Granted Patents)

Location History:

Kirchweidach, DE (2017)
Zeilarn, DE (2008 - 2018)

Company Filing History:

Years Active: 2008-2026

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10 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12637786 - Method for producing a gallium oxide layer on a substrate (2026-05-26),

2. 10031082 - Compositional analysis of a gas or gas stream in a chemical reactor and method for preparing chlorosilanes in a fluidized bed reactor (2018-07-24),

3. 9988714 - Process for producing polysilicon (2018-06-05),

4. 9738531 - Process for producing polycrystalline silicon (2017-08-22),

5. 9650255 - Reactor and process for endothermic gas phase reaction in a reactor (2017-05-16),

6. 9089788 - Process for purifying chlorosilanes by distillation (2015-07-28),

7. 8940264 - Process for producing polycrystalline silicon (2015-01-27),

8. 8231725 - Semiconductor wafers of silicon and method for their production (2012-07-31),

9. 8043427 - Semiconductor wafers of silicon and method for their production (2011-10-25),

10. 7387676 - Process for producing silicon semiconductor wafers with defined defect properties, and silicon semiconductor wafers having these defect properties (2008-06-17),

Title: Walter Haeckl: Innovator in Chemical Reactor Technology

Introduction

Walter Haeckl is a notable inventor based in Zeilarn, Germany. He holds a total of nine patents, showcasing his significant contributions to the field of chemical engineering and reactor technology. His innovative work has led to advancements in the compositional analysis of gases and the production of polysilicon.

Latest Patents

Haeckl's latest patents include a method for compositional analysis of a gas or gas stream in a chemical reactor. This method involves removing aluminum chloride from the gas and analyzing the remaining gas using gas chromatography or spectroscopy. Another significant patent details a process for preparing chlorosilanes in a fluidized bed reactor, which requires a specific temperature profile for optimal reaction conditions. Additionally, he has developed a process for producing polysilicon, which includes depositing polycrystalline silicon on filaments using a reaction gas containing trichlorosilane and hydrogen.

Career Highlights

Throughout his career, Walter Haeckl has worked with prominent companies such as Wacker Chemie AG and Siltronic AG. His experience in these organizations has allowed him to refine his expertise in chemical processes and reactor design. His patents reflect a deep understanding of the complexities involved in chemical reactions and material production.

Collaborations

Haeckl has collaborated with notable colleagues, including Wilfried Von Ammon and Uwe Paetzold. These partnerships have likely contributed to the innovative nature of his work and the successful development of his patented technologies.

Conclusion

Walter Haeckl's contributions to chemical engineering through his patents and collaborations highlight his role as a significant innovator in the field. His work continues to influence advancements in chemical reactor technology and polysilicon production.

Profile summary based on public USPTO records.