Oberhaching, Germany

Walter Glashauser


Average Co-Inventor Count = 2.4

ph-index = 8

Forward Citations = 141(Granted Patents)


Location History:

  • Munich, DE (1983 - 1985)
  • Deisenhofen, DE (1998)
  • Diesenhofen, DE (2000)
  • Unterhaching, DE (2003)
  • Ringstrasse, DE (2004 - 2005)
  • Poughkeepsie, NY (US) (2004 - 2006)
  • Oberhaching, DE (2002 - 2007)

Company Filing History:


Years Active: 1983-2007

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14 patents (USPTO):

Title: Innovations and Contributions of Walter Glashauser

Introduction

Walter Glashauser, an esteemed inventor based in Oberhaching, Germany, has made significant contributions to the field of semiconductor technology. With a total of 14 patents to his name, his inventions primarily focus on enhancing the efficiency and performance of chemical mechanical polishing processes.

Latest Patents

Among Walter Glashauser’s latest contributions are two notable patents. The first, titled "Configuration and method for mounting a backing film to a polish head," describes a process where heat and pressure are applied to an adhesive layer while mounting it to a polish head. This innovation addresses issues like thickness variations and air bubbles within the adhesive layer, facilitating uniform material removal from semiconductor wafer surfaces. The configuration includes devices for exerting uniform pressure and controlling heat, ultimately increasing wafer yield.

The second patent, "Method and configuration for conditioning a polishing pad surface," outlines a method to monitor the condition of polishing pads. It employs electrical power measurements from a rotating table as an indicator of the pad's abrasion effectiveness. This patent issues a warning signal when the power input surpasses certain limits, prompting corrective actions to maintain the conditioning process.

Career Highlights

Walter Glashauser has collaborated with prestigious organizations throughout his career. Notably, he has worked at Siemens Aktiengesellschaft and International Business Machines Corporation (IBM), both of which are renowned for their innovative advancements in technology. His experiences in these companies have undoubtedly contributed to his expertise and the development of his patents.

Collaborations

Throughout his career, Walter has shared his professional journey with talented colleagues, including Katrin Ebner and Max Gerald Levy. These collaborations have fostered an environment of innovation, enabling the exchange of ideas and further advancements in the field.

Conclusion

Walter Glashauser stands out as a significant figure in the realm of semiconductor technology. His patents have not only advanced methodologies in chemical mechanical polishing but have also contributed to increased efficiency in semiconductor manufacturing. His work exemplifies the spirit of innovation that drives progress in technology.

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