The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2002
Filed:
Aug. 14, 2000
Applicant:
Inventor:
Walter Glashauser, Oberhaching, DE;
Assignee:
Semiconductor 300 GmbH & Co. KG, Dresden, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 2/900 ;
U.S. Cl.
CPC ...
B24B 2/900 ;
Abstract
In a chemical-mechanical polishing machine ( ) where a polishing head ( ) holds a wafer ( ) against a polishing pad ( ), a retaining ring ( ) that surrounds the wafer ( ) has an open chamber ( ) to distribute pressurized slurry ( ) to the polishing pad ( ) and to the periphery ( ) of the wafer ( ).