The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2005

Filed:

Jun. 20, 2003
Applicants:

Gregory Costrini, Hopewell Junction, NY (US);

Kia-seng Low, Hopewell Junction, NY (US);

David L. Rath, Stormville, NY (US);

Michael C. Gaidis, Wappingers Falls, NY (US);

Walter Glashauser, Ringstrasse, DE;

Inventors:

Gregory Costrini, Hopewell Junction, NY (US);

Kia-Seng Low, Hopewell Junction, NY (US);

David L. Rath, Stormville, NY (US);

Michael C. Gaidis, Wappingers Falls, NY (US);

Walter Glashauser, Ringstrasse, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/4763 ; H01L021/311 ;
U.S. Cl.
CPC ...
Abstract

Self-aligning vias and trenches etched between adjacent lines of metallization allows the area of the dielectric substrate allocated to the via or trench to be significantly reduced without increasing the possibility of electrical shorts to the adjacent lines of metallization.


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