Tokyo, Japan

Wakana Fuse

This inventor holds 5 USPTO granted patents and 1 published patent application. Top assignees: Adeka Corporation, Samsung Electronics Co., Ltd., Samsung Electronics Ltd.. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wakana Fuse. Retrieved from https://idiyas.com/inventor/wakana-fuse

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 60.0

Average Co-Inventor Count = 10.7

ph-index = 1


Company Filing History:


Years Active: 2022-2026

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Wakana Fuse - A Pioneer in Niobium Compound Innovations

Introduction

Wakana Fuse, based in Tokyo, Japan, is an inventor recognized for his contributions to materials science, particularly through his innovative work with niobium compounds. With a patent to his name, he has made significant strides in the development of thin film technologies that hold promise for various applications.

Latest Patents

Wakana Fuse's patent, titled "Niobium compound and method of forming thin film," outlines a novel niobium compound represented by a specific general formula. This invention details a method for forming a thin film using the niobium compound, showcasing its potential utility in advanced electronic and material applications.

Career Highlights

Wakana's professional journey includes pivotal roles at renowned companies such as Samsung Electronics and Adeka Corporation. His experiences in these prestigious firms have allowed him to refine his expertise and contribute meaningfully to the field of materials science.

Collaborations

Throughout his career, Wakana has collaborated with talented professionals, including his coworkers Soyoung Lee and Seungmin Ryu. These partnerships have enriched his research endeavors and fostered an environment of creativity and innovation.

Conclusion

Wakana Fuse exemplifies the spirit of innovation in the realm of materials science. His patent for a niobium compound and the method for forming thin films reflects a commitment to advancing technology and addressing future challenges. With his continued contributions, he remains a notable figure in the world of inventors and technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…