Raanana, Israel

Vladislav Kaplan

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2019-2022

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3 patents (USPTO):Explore Patents

Title: Innovations of Vladislav Kaplan in Pattern Measurement and Overlay Monitoring

Introduction

Vladislav Kaplan, an accomplished inventor based in Raanana, Israel, has made significant contributions to the field of imaging technologies with a total of three patents to his name. His work focuses on advanced methods for measuring patterns and monitoring overlays, which have implications in various manufacturing processes, particularly in the semiconductor industry.

Latest Patents

Kaplan's latest patents showcase sophisticated methodologies aimed at enhancing precision in imaging and measurement.

1. **Measuring a Pattern**: This innovation involves a comprehensive method that includes obtaining an electron image of a sample area, applying noise reduction techniques to improve the clarity of the image, and analyzing the resulting image to provide accurate pattern measurements. The unique approach utilizes a noise reduction kernel that adapts based on the relationships of different widths to optimize the measurement process.

2. **Overlay Monitoring**: In this patent, a method for overlay monitoring is described, which includes a series of steps to obtain secondary and backscattered electron images of a substrate containing structural elements. It defines important regions based on the locations of first structural elements and processes these images to calculate overlay errors. This innovation ensures that the positioning of structural elements is critically assessed to maintain manufacturing standards.

Career Highlights

Vladislav Kaplan is currently employed at Applied Materials Israel Limited, a key player in the technology and manufacturing sector. His expertise in imaging technologies has positioned him as an influential inventor within the company.

Collaborations

Throughout his career, Kaplan has worked alongside talented colleagues such as Shay Attal and Lavi Jacov Shachar. Their collaboration has fostered innovative ideas and has undoubtedly contributed to the success of their projects.

Conclusion

Vladislav Kaplan's inventions symbolize the intersection of innovative technology and practical application within the semiconductor industry. His work continues to pave the way for advancements in pattern measurement and overlay monitoring, reinforcing the importance of precision in manufacturing processes.

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