The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Aug. 22, 2022
Applied Materials Israel Ltd., Rehovot, IL;
Dror Alumot, Tel Aviv, IL;
Tal Ben-Shlomo, Givatayim, IL;
Vladislav Kaplan, Raanana, IL;
Yaniv Abramovitz, Mazkeret Batya, IL;
Dan Tuvia Fuchs, Tel Aviv, IL;
Michael Elliot Adel, Zichron Ya'akov, IL;
Applied Materials Israel Ltd., Rehovot, IL;
Abstract
There is provided a system and method of determining an overlay measurement between a first layer and a second layer of a specimen. The method includes acquiring a first image of a first structure on the first layer and a second image of a second structure on the second layer, obtaining one or more first regions of interest (ROIs) enclosing part of the first structure and one or more second ROIs enclosing part of the second structure, determining one or more first sets of symmetric sub-structures based on the first ROIs and one or more second sets of symmetric sub-structures based on the second ROIs, localizing a first center of symmetry (COS) based on a COS identified for each first set, and localizing a second COS based on a COS identified for each second set, and determining the overlay measurement based on the first COS and the second COS.