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For the Inventor, By the Inventor

Helsinki, Finland

Ville Antero Saanila

This inventor holds 18 USPTO granted patents, primarily in Thin Film Deposition. Top assignees: Asm International N.v., Asm Microchemistry Oy, Interuniversitair Nizroelecmica. Active years: 2002-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ville Antero Saanila. Retrieved from https://idiyas.com/inventor/ville-antero-saanila

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 18

% Patents Active = 94.4

Average Co-Inventor Count = 4.9

ph-index = 17

Forward Citations = 3,663(Granted Patents)


Company Filing History:

goldMedal12 out of 313 
 
Asm International N.v.
 patents
silverMedal3 out of 19 
 
Asm Microchemistry Oy
 patents
bronzeMedal1 out of 1 
 
Interuniversitair Nizroelecmica
 patent
4. 1 out of 144 
 
Nobel Biocare Services, Ag
 patents
5. 2 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 2002-2010

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Areas of Expertise:
Nanolaminate Films
Transition Metal Nitrides
Boron-Containing Reducing Agents
Metallization
Elemental Thin Films
Atomic Layer Deposition
Conformal Lining Layers
Barrier Layers
Metal Carbides
Integrated Circuits
Damascene Metallization
18 patents (USPTO):Explore Patents
1. 7749871 - Method for depositing nanolaminate thin films on sensitive surfaces (2010-07-06),
2. 7670944 - Conformal lining layers for damascene metallization (2010-03-02),
3. 7485340 - Production of elemental films using a boron-containing reducing agent (2009-02-03),
4. 7329590 - Method for depositing nanolaminate thin films on sensitive surfaces (2008-02-12),
5. 7144809 - Production of elemental films using a boron-containing reducing agent (2006-12-05),
6. 6902763 - Method for depositing nanolaminate thin films on sensitive surfaces (2005-06-07),
7. 6863727 - Method of depositing transition metal nitride thin films (2005-03-08),
8. 6852635 - Method for bottomless deposition of barrier layers in integrated circuit metallization schemes (2005-02-08),
9. 6821889 - Production of elemental thin films using a boron-containing reducing agent (2004-11-23),
10. 6820570 - Atomic layer deposition reactor (2004-11-23),
11. 6800552 - Deposition of transition metal carbides (2004-10-05),
12. 6794287 - Process for growing metal or metal carbide thin films utilizing boron-containing reducing agents (2004-09-21),
13. 6727169 - Method of making conformal lining layers for damascene metallization (2004-04-27),
14. 6664192 - Method for bottomless deposition of barrier layers in integrated circuit metallization schemes (2003-12-16),
15. 6599572 - Process for growing metalloid thin films utilizing boron-containing reducing agents (2003-07-29),

Title: Ville Antero Saanila - Innovative Inventor from Helsinki

Introduction: Ville Antero Saanila is a renowned inventor hailing from Helsinki, Finland, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Ville Antero Saanila holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his commitment to creating solutions for a better future.

Career Highlights: With a career spanning over two decades, Ville Antero Saanila has worked with leading tech companies and research institutions, where he has spearheaded projects that have revolutionized various industries.

Collaborations: Ville Antero Saanila has collaborated with top scientists, engineers, and researchers from around the world, fostering a culture of innovation and knowledge-sharing to drive progress in the field of technology.

Conclusion: Ville Antero Saanila's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and entrepreneurs, leaving a lasting impact on the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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