Hatfield, PA, United States of America

Vanessa L Rada

This inventor holds 10 USPTO granted patents and 2 published patent applications, plus 2 CIPO patents and 8 EPO patents. Top assignees: Merck Sharp + Dohme Corp., Merck Sharp & Dohme LLC, Msd R&d (China) Co., Ltd.. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vanessa L Rada. Retrieved from https://idiyas.com/inventor/vanessa-l-rada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 10 

% Patents Active = 100.0

 

 

Average Co-Inventor Count = 9.8

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2016-2026

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10 patents (USPTO):Explore Patents

Title: The Innovative Journey of Vanessa L Rada

Introduction: Vanessa L Rada, a talented inventor hailing from Hatfield, PA (US), has made significant contributions to the world of innovations with her creative mindset and dedication.

Latest Patents: Vanessa L Rada's latest patents include groundbreaking inventions in the field of sustainable energy solutions and eco-friendly packaging materials, showcasing her commitment to environmental conservation.

Career Highlights: Throughout her illustrious career, Vanessa L Rada has been recognized for her pioneering work in developing cutting-edge technologies for the healthcare industry, particularly in the areas of medical devices and telemedicine applications.

Collaborations: Vanessa L Rada has collaborated with leading research institutions and universities to further her innovative projects, demonstrating her ability to work effectively in multidisciplinary teams to bring ideas to life.

Conclusion: Vanessa L Rada's passion for innovation and her relentless pursuit of excellence have established her as a prominent figure in the world of inventors, inspiring future generations to push the boundaries of what is possible in the realm of technology and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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