Geiselbach, Germany

Uwe Konietzka

This inventor holds 7 USPTO granted patents and 2 published patent applications and 4 EPO patents. Top assignees: Degussa Aktiengesellschaft, Materion Advanced Materials Germany Gmbh, Heraeus Deutschland Gmbh & Co Kg. Active years: 1995-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Uwe Konietzka. Retrieved from https://idiyas.com/inventor/uwe-konietzka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 71.4

 

Average Co-Inventor Count = 3.9

ph-index = 4

Forward Citations = 24(Granted Patents)


Location History:

  • Rodenbach, DE (1995 - 1996)
  • Geiselbach, DE (1996 - 2021)

Company Filing History:


Years Active: 1995-2026

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7 patents (USPTO):Explore Patents

Title: Uwe Konietzka: Innovator in Sputtering Technology

Introduction

Uwe Konietzka is a notable inventor based in Geiselbach, Germany. He has made significant contributions to the field of sputtering technology, particularly through his innovative patents. With a total of 7 patents to his name, Konietzka has established himself as a key figure in the development of advanced materials for various applications.

Latest Patents

One of his latest patents is focused on a silver alloy-based sputter target. This invention relates to a sputtering target that comprises a silver alloy, which is essential for producing high-quality displays. The patent addresses the challenges associated with spark discharges during the sputtering process, especially when working with larger targets. The proposed solution involves a silver base alloy with specific crystalline structures and purity levels, ensuring a more efficient sputtering process.

Career Highlights

Throughout his career, Uwe Konietzka has worked with prominent companies in the industry. He has been associated with Degussa Aktiengesellschaft and Leybold Materials GmbH, where he contributed to the advancement of materials science and engineering. His work has been instrumental in enhancing the performance and reliability of sputtering targets used in various high-tech applications.

Collaborations

Konietzka has collaborated with several professionals in his field, including Martin Weigert and Martin Schlott. These collaborations have further enriched his research and development efforts, leading to innovative solutions in sputtering technology.

Conclusion

Uwe Konietzka's contributions to sputtering technology and his innovative patents highlight his expertise and commitment to advancing material science. His work continues to influence the industry, paving the way for future innovations in high-resolution display technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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