The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2015

Filed:

Mar. 18, 2013
Applicant:

Heraeus Materials Technology Gmbh & Co. KG, Hanau, DE;

Inventors:

Martin Schlott, Offenbach, DE;

Sabine Schneider-Betz, Dreieich, DE;

Uwe Konietzka, Geiselbach, DE;

Markus Schultheis, Flieden, DE;

Ben Kahle, Alzenau, DE;

Lars Ebel, Freigericht, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 9/00 (2006.01); C23C 14/34 (2006.01); C22C 5/06 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C22C 5/06 (2013.01); H01J 37/3414 (2013.01); H01J 37/3426 (2013.01);
Abstract

Planar or tubular sputtering targets made of a silver base alloy and at least one further alloy component selected from indium, tin, antimony, and bismuth accounting jointly for a weight fraction of 0.01 to 5.0% by weight are known. However, moving on to ever larger targets, spark discharges are evident and often lead to losses especially in the production of large and high-resolution displays having comparatively small pixels. For producing a sputtering target with a large surface area on the basis of a silver alloy of this type, which has a surface area of more than 0.3 mas a planar sputtering target and has a length of at least 1.0 m as a tubular sputtering target, and in which the danger of spark discharges is reduced and thus a sputtering process with comparatively high power density is made feasible, the invention proposes that the silver base alloy has a crystalline structure with a mean grain size of less than 120 μm, an oxygen content of less than 50 wt.-ppm, a content of the impurity elements, aluminum, lithium, sodium, calcium, magnesium, barium, and chromium, each of less than 0.5 wt.-ppm, and a metallic purity of at least 99.99% by weight.


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