The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Dec. 02, 2021
Materion Advanced Materials Germany Gmbh, Alzenau, DE;
Uwe Konietzka, Geiselbach, DE;
Martin Schlott, Offenbach, DE;
Materion Advanced Materials Germany GmbH, Alzenau, DE;
Abstract
The present invention relates to a sputtering target consisting of an alloy consisting of Co, Zr, Ta and, optionally, one or more further element(s) X from the group of Mo, Pd, Ni, Ti, V, W, and B, characterized in that the target has a maximum magnetic permeability μof 60 or lower and/or characterized in that the target has a maximum pass through flux (PTF) variation (F−F)/Fof 0.2 or lower, preferably of 0.15 or lower, and most preferably of 0.10 or lower.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile