Tel Aviv, Israel

Uri Hadar

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: The Innovations of Uri Hadar

Introduction

Uri Hadar is a notable inventor based in Tel Aviv, Israel. He has made significant contributions to the field of semiconductor examination through his innovative patent. His work reflects a deep understanding of the complexities involved in analyzing semiconductor specimens.

Latest Patents

Uri Hadar holds a patent titled "Shape localization for examining a semiconductor specimen." This patent describes a system and method for examining a specimen that includes a first layer and a second layer. The method involves obtaining a recipe that includes a template image for each reference polygon in a reference image, along with a template mask that indicates the proximity of a set of locations in the template image to the edge of the reference polygon. The process includes obtaining an inspection image in real-time, identifying first inspection polygons in the inspection image that correspond to the first reference polygons using the template images and masks, and determining shifts for both layers to register the reference polygons with the inspection image.

Career Highlights

Uri is currently employed at Applied Materials Israel Limited, where he continues to develop and refine his innovative ideas. His work at this company has allowed him to contribute to advancements in semiconductor technology, showcasing his expertise and dedication to the field.

Collaborations

Uri collaborates with talented individuals such as Gilad Vered and Dror Alumot. Their teamwork enhances the innovative environment at Applied Materials Israel Limited, fostering creativity and technical excellence.

Conclusion

Uri Hadar's contributions to semiconductor examination through his patent demonstrate his innovative spirit and technical expertise. His work not only advances the field but also highlights the importance of collaboration in driving technological progress.

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