The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2025

Filed:

Sep. 01, 2022
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Doron Girmonsky, Raanana, IL;

Michal Eilon, Beit-Elazari, IL;

Dror Shemesh, Hod Hasharon, IL;

Uri Hadar, Tel-Aviv, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/2252 (2018.01); G06N 3/08 (2023.01);
U.S. Cl.
CPC ...
G01N 23/2252 (2013.01); G06N 3/08 (2013.01);
Abstract

A computer-based method for non-destructive z-profiling of samples. The method includes: a measurement operation and a data analysis operation. The measurement operation includes, for each of a plurality of landing energies: (i) projecting an electron beam on a sample at a respective landing energy, such that light-emitting interactions between electrons from the electron beam and the sample occur within a respective probed region of the sample, which is centered about a respective depth; and (ii) measuring the emitted light to obtain an optical emission data set of the sample. The data analysis operation includes obtaining from the measured optical emission data sets a concentration map quantifying a dependence of a concentration of a material, which the sample comprises, on at least the depth.


Find Patent Forward Citations

Loading…