The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Aug. 03, 2022
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Gilad Vered, Giv'at Shmuel, IL;

Dror Alumot, Tel Aviv, IL;

Uri Hadar, Tel Aviv, IL;

Elran Gamzo, Rosh Haayin, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/50 (2017.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 7/50 (2017.01); G06T 2207/30148 (2013.01);
Abstract

There is provided a system and method of examining a specimen comprising a first layer and a second layer. The method comprises obtaining a recipe including a template image for each reference polygon in a reference image and a template mask indicative of proximity of a set of locations in the template image to an edge of the reference polygon; obtaining an inspection image in runtime; identifying first inspection polygons in the inspection image corresponding to the first reference polygons using template images and template masks thereof; determining a first shift for the first layer based on the first locations, and registering the first reference polygons with the inspection image based on the first shift. Similarly, a second shift for the second layer can be determined, and the second reference polygons can be registered with the inspection image based on the second shift.


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